Laser micro-machining of waveguide devices for sub-mm and far IR interferometry and detector arrays

Christian Y.Drouët D'Aubigny, Christopher K. Walker, Dathon Golish, Mark R. Swain, Philip J. Dumont, Peter R. Lawson

Research output: Contribution to journalConference article

4 Scopus citations

Abstract

Laser induced, micro-chemical etching is a promising new technology that can be used to fabricate three dimensional structures many millimeters across with micrometer accuracy. Laser micromachining possesses a significant edge over more conventional techniques. It does not require the use of masks and is not confined to crystal planes. A non-contact process, it eliminates tool wear and vibration problems associated with classical milling machines. At the University of Arizona we have constructed the first such laser micromachining system optimized for the fabrication of THz and far IR waveguide and quasi-optical components. Our system can machine many millimeters across down to a few microns accuracy in a short time, with a remarkable surface finish. This paper presents the design, operation and performance of our system, and its applications to waveguide devices for sub millimeter and far IR interferometry.

Original languageEnglish (US)
Pages (from-to)568-580
Number of pages13
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4852
Issue number2
DOIs
StatePublished - Dec 1 2002
EventInterferometry in Space - Waikoloa, HI, United States
Duration: Aug 26 2002Aug 28 2002

Keywords

  • Chemical etching
  • Detector arrays
  • FIR
  • Interferometry
  • Laser machining
  • Silicon
  • THz
  • Waveguide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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