Low loss etchless photodefined polymer optical waveguides

Julie I. Frish, Kyung Jo Kim, Roland Himmelhuber, Sasaan Showghi, Robert A Norwood

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Etchless photodefined polymer optical waveguides are created through direct-write lithography and commercially available materials. Bypassing wet development provides benefits to optical chip-to-chip devices. At 1550nm telecommunication wavelengths, optical propagation loss is less than 1 dB/cm.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2018
PublisherOSA - The Optical Society
VolumePart F92-CLEO_AT 2018
ISBN (Electronic)9781557528209
DOIs
StatePublished - Jan 1 2018
EventCLEO: Applications and Technology, CLEO_AT 2018 - San Jose, United States
Duration: May 13 2018May 18 2018

Other

OtherCLEO: Applications and Technology, CLEO_AT 2018
CountryUnited States
CitySan Jose
Period5/13/185/18/18

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

Cite this

Frish, J. I., Kim, K. J., Himmelhuber, R., Showghi, S., & Norwood, R. A. (2018). Low loss etchless photodefined polymer optical waveguides. In CLEO: Applications and Technology, CLEO_AT 2018 (Vol. Part F92-CLEO_AT 2018). OSA - The Optical Society. https://doi.org/10.1364/CLEO_AT.2018.JW2A.41