Mask fabrication towards sub-10 nm imprint lithography

Jian Gu, Chun Ping Jen, Qihuo Wei, Chiafu Chou, Frederic Zenhausern

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We report for the first time the use of orientation dependent etching (ODE) of (110) c-Si in sidewall thin film technology for imprint mask fabrication with low line edge roughness (LER) over a large area. Oxidation is used for sidewall thin film formation with a good critical dimension control. 2-dimensional oxidation effects are discussed. Features down to 12 nm have been fabricated successfully. Simulation shows that the fabricated oxide line is strong enough to imprint both thermoplastic and photo-curable imprint resists.

Original languageEnglish (US)
Title of host publicationProgress in Biomedical Optics and Imaging - Proceedings of SPIE
EditorsR.S. Mackay
Pages382-391
Number of pages10
Volume5751
EditionI
DOIs
StatePublished - 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005

Other

OtherEmerging Lithographic Technologies IX
CountryUnited States
CitySan Jose, CA
Period3/1/053/3/05

Fingerprint

Lithography
Masks
Fabrication
Thin films
Oxidation
Thermoplastics
Etching
Surface roughness
Oxides

Keywords

  • 2-dimensional oxidation
  • Crystalline silicon
  • Imprint lithography
  • Mask fabrication
  • Orientation dependent etching
  • Sidewall thin-film

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Gu, J., Jen, C. P., Wei, Q., Chou, C., & Zenhausern, F. (2005). Mask fabrication towards sub-10 nm imprint lithography. In R. S. Mackay (Ed.), Progress in Biomedical Optics and Imaging - Proceedings of SPIE (I ed., Vol. 5751, pp. 382-391). [41] https://doi.org/10.1117/12.600207

Mask fabrication towards sub-10 nm imprint lithography. / Gu, Jian; Jen, Chun Ping; Wei, Qihuo; Chou, Chiafu; Zenhausern, Frederic.

Progress in Biomedical Optics and Imaging - Proceedings of SPIE. ed. / R.S. Mackay. Vol. 5751 I. ed. 2005. p. 382-391 41.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gu, J, Jen, CP, Wei, Q, Chou, C & Zenhausern, F 2005, Mask fabrication towards sub-10 nm imprint lithography. in RS Mackay (ed.), Progress in Biomedical Optics and Imaging - Proceedings of SPIE. I edn, vol. 5751, 41, pp. 382-391, Emerging Lithographic Technologies IX, San Jose, CA, United States, 3/1/05. https://doi.org/10.1117/12.600207
Gu J, Jen CP, Wei Q, Chou C, Zenhausern F. Mask fabrication towards sub-10 nm imprint lithography. In Mackay RS, editor, Progress in Biomedical Optics and Imaging - Proceedings of SPIE. I ed. Vol. 5751. 2005. p. 382-391. 41 https://doi.org/10.1117/12.600207
Gu, Jian ; Jen, Chun Ping ; Wei, Qihuo ; Chou, Chiafu ; Zenhausern, Frederic. / Mask fabrication towards sub-10 nm imprint lithography. Progress in Biomedical Optics and Imaging - Proceedings of SPIE. editor / R.S. Mackay. Vol. 5751 I. ed. 2005. pp. 382-391
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