Maskless lithography tool for fabrication and inspection of diffractive optical elements and computer generated holograms

M. Zaverton, J. Sierchio, Y. S. Kim, D. Hansen, W. Bletcher, J. Tamkin, T. D. Milster

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

A high-speed maskless lithography tool is described for fabricating diffractive optical elements and computer generated holograms. The system has the capability to write gray-scale features is also used for inspection of the sample after fabrication.

Original languageEnglish (US)
Title of host publicationOptical Fabrication and Testing, OFT 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528933
DOIs
StatePublished - 2010
EventOptical Fabrication and Testing, OFT 2010 - Jackson Hole, WY, United States
Duration: Jun 13 2010Jun 17 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherOptical Fabrication and Testing, OFT 2010
CountryUnited States
CityJackson Hole, WY
Period6/13/106/17/10

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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    Zaverton, M., Sierchio, J., Kim, Y. S., Hansen, D., Bletcher, W., Tamkin, J., & Milster, T. D. (2010). Maskless lithography tool for fabrication and inspection of diffractive optical elements and computer generated holograms. In Optical Fabrication and Testing, OFT 2010 (Optics InfoBase Conference Papers). Optical Society of America (OSA). https://doi.org/10.1364/oft.2010.otuc5