Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

M. Keswani, S. Raghavan, R. Govindarajan, I. Brown

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Megasonic irradiation of aqueous solutions produces hydroxyl radicals primarily from dissociation of water under extreme transient cavitation temperature conditions. In the current study, the effect of various sound field (∼1 MHz) and solution parameters on rate of generation of hydroxyl radicals in alkaline cleaning solutions of interest to semiconductor industry has been investigated. These parameters include transducer power density, liquid temperature, nature of dissolved gases, solution pH, and type of alkali. Terephthalic acid based fluorescence spectroscopy technique is used for the measurement of concentration of hydroxyl radicals.

Original languageEnglish (US)
Pages (from-to)61-65
Number of pages5
JournalMicroelectronic Engineering
Volume118
DOIs
StatePublished - Apr 25 2014

Keywords

  • Alkaline solutions
  • Fluorescence spectroscopy
  • Hydroxyl radicals
  • Megasonic irradiation
  • Terephthalic acid

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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