Measuring electrokinetic characteristics of positive photoresist particles

Iqbal Ali, Srini Raghavan

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The purpose of our study was to determine the zeta potential of positive photoresist particles in a number of aqueous solutions of interest to semiconductor processing. Electrophoretic measurements carried out on unexposed and UV-exposed positive photoresist particles have shown that such particles develop a surface charge in aqueous solutions. The experiments also revealed that the zeta potential of the particles is a function of pH and the oxidation potential of the aqueous system, and that UV-exposed particles are characterized by a slightly lower IEP than are unexposed resist particles.

Original languageEnglish (US)
Pages (from-to)35-37, 58
JournalMicrocontamination
Volume8
Issue number3
StatePublished - Mar 1990
Externally publishedYes

Fingerprint

electrokinetics
Photoresists
Zeta potential
photoresists
Surface charge
Semiconductor materials
Oxidation
Processing
aqueous solutions
Experiments
oxidation

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Measuring electrokinetic characteristics of positive photoresist particles. / Ali, Iqbal; Raghavan, Srini.

In: Microcontamination, Vol. 8, No. 3, 03.1990, p. 35-37, 58.

Research output: Contribution to journalArticle

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