The purpose of our study was to determine the zeta potential of positive photoresist particles in a number of aqueous solutions of interest to semiconductor processing. Electrophoretic measurements carried out on unexposed and UV-exposed positive photoresist particles have shown that such particles develop a surface charge in aqueous solutions. The experiments also revealed that the zeta potential of the particles is a function of pH and the oxidation potential of the aqueous system, and that UV-exposed particles are characterized by a slightly lower IEP than are unexposed resist particles.
|Original language||English (US)|
|Pages (from-to)||35-37, 58|
|State||Published - Mar 1 1990|
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