Mechanisms for synergistic oxidation of organics in ultrapure water systems

Kon Tsu Kin, Farhang Shadman

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A mechanistic model is developed for the distribution, oxidation, and removal of organic impurities in typical polishing loops of ultrapure water (UPW) plants. The model is applied to the case of the oxidation of organics by ultraviolet (UV), ozone, and a unique method of adding ozone to the UV unit. The model is validated with direct experimental measurements using various oxidation tests. In particular, the accumulation problem related to the recalcitrant (hard to remove) impurities in the UPW systems with recycle is explained. The model is also used to analyze the dynamic behavior of polishing and reclaim/recycle loops. The results show the potential oscillatory behavior of UPW loops in case of impurity surges. This behavior is important and needs to be prevented to avoid metrology and control problems.

Original languageEnglish (US)
Pages (from-to)1-9
Number of pages9
JournalIEEE Transactions on Semiconductor Manufacturing
Volume13
Issue number1
DOIs
StatePublished - 2000

Fingerprint

Oxidation
oxidation
Water
Ozone
Impurities
Polishing
polishing
impurities
water
ozone
metrology

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Industrial and Manufacturing Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics

Cite this

Mechanisms for synergistic oxidation of organics in ultrapure water systems. / Kin, Kon Tsu; Shadman, Farhang.

In: IEEE Transactions on Semiconductor Manufacturing, Vol. 13, No. 1, 2000, p. 1-9.

Research output: Contribution to journalArticle

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