Method for measuring thermal contact resistance of graphite thin film materials

Xiaogang Li, Renxi Luo, Weifang Zhang, Haitao Liao

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Thermal contact resistance (TCR) is an important parameter in thermal analysis of materials. Because of many influential factors, it is difficult to find a general model or computational formula to calculate the TCR of a solid interface. In many engineering applications, TCR values are usually obtained through experiments. Unlike extensive research focusing on ordinary columnar materials, this paper aims at measuring the TCR values of graphite thin film materials. The technical challenge is that it is not convenient to embed thermocouples into such materials. To overcome this challenge, a steady-state method using a copper heat flux meter is developed, which provides a useful tool for indirect TCR measurement. In our experiments, the TCR values of the graphite thin film materials are successfully measured under different temperature and pressure levels. The results provide a valuable guideline for the use of this type of material in high-temperature, high-pressure applications.

Original languageEnglish (US)
Pages (from-to)202-207
Number of pages6
JournalMeasurement: Journal of the International Measurement Confederation
Volume93
DOIs
StatePublished - Nov 1 2016
Externally publishedYes

Fingerprint

Contact Resistance
Thermal Resistance
Graphite
Contact resistance
contact resistance
Thin Films
graphite
contact
Thin films
thin films
Values
Thermal Analysis
experiment
thermocouples
Thermocouples
Engineering Application
Heat Flux
Copper
Thermoanalysis
heat

Keywords

  • Graphite thin film materials
  • Heat flux
  • Interface temperature drop
  • Scanning electron microscope
  • Thermal contact resistance

ASJC Scopus subject areas

  • Statistics and Probability
  • Education
  • Condensed Matter Physics
  • Applied Mathematics

Cite this

Method for measuring thermal contact resistance of graphite thin film materials. / Li, Xiaogang; Luo, Renxi; Zhang, Weifang; Liao, Haitao.

In: Measurement: Journal of the International Measurement Confederation, Vol. 93, 01.11.2016, p. 202-207.

Research output: Contribution to journalArticle

@article{8280fb6915c3418384ebb1b0e6090475,
title = "Method for measuring thermal contact resistance of graphite thin film materials",
abstract = "Thermal contact resistance (TCR) is an important parameter in thermal analysis of materials. Because of many influential factors, it is difficult to find a general model or computational formula to calculate the TCR of a solid interface. In many engineering applications, TCR values are usually obtained through experiments. Unlike extensive research focusing on ordinary columnar materials, this paper aims at measuring the TCR values of graphite thin film materials. The technical challenge is that it is not convenient to embed thermocouples into such materials. To overcome this challenge, a steady-state method using a copper heat flux meter is developed, which provides a useful tool for indirect TCR measurement. In our experiments, the TCR values of the graphite thin film materials are successfully measured under different temperature and pressure levels. The results provide a valuable guideline for the use of this type of material in high-temperature, high-pressure applications.",
keywords = "Graphite thin film materials, Heat flux, Interface temperature drop, Scanning electron microscope, Thermal contact resistance",
author = "Xiaogang Li and Renxi Luo and Weifang Zhang and Haitao Liao",
year = "2016",
month = "11",
day = "1",
doi = "10.1016/j.measurement.2016.07.015",
language = "English (US)",
volume = "93",
pages = "202--207",
journal = "Measurement",
issn = "1536-6367",
publisher = "Elsevier",

}

TY - JOUR

T1 - Method for measuring thermal contact resistance of graphite thin film materials

AU - Li, Xiaogang

AU - Luo, Renxi

AU - Zhang, Weifang

AU - Liao, Haitao

PY - 2016/11/1

Y1 - 2016/11/1

N2 - Thermal contact resistance (TCR) is an important parameter in thermal analysis of materials. Because of many influential factors, it is difficult to find a general model or computational formula to calculate the TCR of a solid interface. In many engineering applications, TCR values are usually obtained through experiments. Unlike extensive research focusing on ordinary columnar materials, this paper aims at measuring the TCR values of graphite thin film materials. The technical challenge is that it is not convenient to embed thermocouples into such materials. To overcome this challenge, a steady-state method using a copper heat flux meter is developed, which provides a useful tool for indirect TCR measurement. In our experiments, the TCR values of the graphite thin film materials are successfully measured under different temperature and pressure levels. The results provide a valuable guideline for the use of this type of material in high-temperature, high-pressure applications.

AB - Thermal contact resistance (TCR) is an important parameter in thermal analysis of materials. Because of many influential factors, it is difficult to find a general model or computational formula to calculate the TCR of a solid interface. In many engineering applications, TCR values are usually obtained through experiments. Unlike extensive research focusing on ordinary columnar materials, this paper aims at measuring the TCR values of graphite thin film materials. The technical challenge is that it is not convenient to embed thermocouples into such materials. To overcome this challenge, a steady-state method using a copper heat flux meter is developed, which provides a useful tool for indirect TCR measurement. In our experiments, the TCR values of the graphite thin film materials are successfully measured under different temperature and pressure levels. The results provide a valuable guideline for the use of this type of material in high-temperature, high-pressure applications.

KW - Graphite thin film materials

KW - Heat flux

KW - Interface temperature drop

KW - Scanning electron microscope

KW - Thermal contact resistance

UR - http://www.scopus.com/inward/record.url?scp=84989929370&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84989929370&partnerID=8YFLogxK

U2 - 10.1016/j.measurement.2016.07.015

DO - 10.1016/j.measurement.2016.07.015

M3 - Article

AN - SCOPUS:84989929370

VL - 93

SP - 202

EP - 207

JO - Measurement

JF - Measurement

SN - 1536-6367

ER -