Micro flow patterns on demand using surface-chemistry technology

Winky Lap Wing Hau, Dieter W. Trau, Nikolaus J. Sucher, Man Wong, Yitshak Zohar

Research output: Contribution to conferencePaper

8 Scopus citations

Abstract

A new technology to pattern surface charges, either negatively or positively, using a standard photolithography process is introduced. Unlimited flow patterns can be generated under an externally applied electric field by electro-osmotic and electrophoretic driving forces to enable fine control of fluid motion in microfluidic devices. Two basic flows, shear and vortical, have been realized experimentally to demonstrate the tremendous potential of this technology, especially in analytical microsystems for genomics or cell biology.

Original languageEnglish (US)
Pages475-478
Number of pages4
StatePublished - Jan 1 2002
Externally publishedYes
Event15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002 - Las Vegas, NV, United States
Duration: Jan 20 2002Jan 24 2002

Other

Other15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002
CountryUnited States
CityLas Vegas, NV
Period1/20/021/24/02

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Hau, W. L. W., Trau, D. W., Sucher, N. J., Wong, M., & Zohar, Y. (2002). Micro flow patterns on demand using surface-chemistry technology. 475-478. Paper presented at 15th IEEE International Conference on Micro Electro Mechanical Systems MEMS 2002, Las Vegas, NV, United States.