Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.

Original languageEnglish (US)
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
PublisherSPIE
ISBN (Print)9780819498878
DOIs
StatePublished - Jan 1 2014
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VII - San Francisco, CA, United States
Duration: Feb 3 2014Feb 5 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8974
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
Country/TerritoryUnited States
CitySan Francisco, CA
Period2/3/142/5/14

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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