Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Thomas D Milster, Yuzuru Takashima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume8974
ISBN (Print)9780819498878
DOIs
Publication statusPublished - 2014
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VII - San Francisco, CA, United States
Duration: Feb 3 2014Feb 5 2014

Other

OtherAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
CountryUnited States
CitySan Francisco, CA
Period2/3/142/5/14

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ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Summitt, C., Wang, S., Johnson, L., Zaverton, M., Ge, T., Milster, T. D., & Takashima, Y. (2014). Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 8974). [89740C] SPIE. https://doi.org/10.1117/12.2045234