Mid-infrared spatial filters fabrication using laser chemical etching

Christian Y. Drouët D'Aubigny, Christopher K Walker, Dathon Golish

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


Feedhorns like those commonly used in radio-telescope and radio communication equipment couple very efficiently (>98%) to the fundamental Gaussian mode (TEM00). High order modes are not propagated through a single-mode hollow metallic waveguides. It follows that a back to back feedhorn design joined with a small length of single-mode waveguide can be used as a very high throughput spatial filter. Laser micro machining provides a mean of scaling successful waveguide and quasi-optical components to far and mid infrared wavelengths. A laser micro machining system optimized for THz and far IR applications has been in operation at Steward Observatory for several years and produced devices designed to operate at λ=60μm. A new laser micromachining system capable of producing mid-infrared devices will soon be operational. These proceedings review metallic hollow waveguide spatial filtering theory, feedhorn designs as well as laser chemical etching and the design of a new high-NA UV laser etcher capable of sub-micron resolution to fabricate spatial filters for use in the mid-infrared.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsW.A. Traub
Number of pages12
EditionPART 2
Publication statusPublished - 2004
EventNew Frontiers in Stellar Interferometry - Glasgow, United Kingdom
Duration: Jun 21 2004Jun 25 2004


OtherNew Frontiers in Stellar Interferometry
CountryUnited Kingdom



  • Chemical Etching
  • Hollow Waveguide
  • Interferometry
  • Laser Machining
  • Silicon
  • Single Mode

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Drouët D'Aubigny, C. Y., Walker, C. K., & Golish, D. (2004). Mid-infrared spatial filters fabrication using laser chemical etching. In W. A. Traub (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (PART 2 ed., Vol. 5491, pp. 655-666). [76] https://doi.org/10.1117/12.552671