Modeling the oxidation of phenolic compounds by hydrogen peroxide photolysis

Tianqi Zhang, Long Cheng, Lin Ma, Fanchao Meng, Robert G. Arnold, A. Eduardo Sáez

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

Hydrogen peroxide UV photolysis is among the most widely used advanced oxidation processes (AOPs) for the destruction of trace organics in waters destined for reuse. Previous kinetic models of hydrogen peroxide photolysis focus on the dynamics of hydroxyl radical production and consumption, as well as the reaction of the target organic with hydroxyl radicals. However, the rate of target destruction may also be affected by radical scavenging by reaction products. In this work, we build a predictive kinetic model for the destruction of p-cresol by hydrogen peroxide photolysis based on a complete reaction mechanism that includes reactions of intermediates with hydroxyl radicals. The results show that development of a predictive kinetic model to evaluate process performance requires consideration of the complete reaction mechanism, including reactions of intermediates with hydroxyl radicals.

Original languageEnglish (US)
Pages (from-to)349-357
Number of pages9
JournalChemosphere
Volume161
DOIs
StatePublished - Oct 1 2016

Keywords

  • Advanced oxidation processes
  • Kinetic model
  • Phenolic compounds
  • Radical reactions

ASJC Scopus subject areas

  • Environmental Engineering
  • Environmental Chemistry
  • Chemistry(all)
  • Pollution
  • Health, Toxicology and Mutagenesis

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