Molecular water accumulation on silica measured with picometer height resolution

Xuefeng Wang, Ming Zhao, David D. Nolte

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We observed water film accumulation on silica surfaces to 1 picometer resolution using optical land-contrast (LC) interferometry. The land-contrast approach is non-destructive and allows real-time measurement of thickness variation of small molecular films.

Original languageEnglish (US)
Title of host publicationOptics InfoBase Conference Papers
StatePublished - 2010
Externally publishedYes
EventConference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States
Duration: May 16 2010May 21 2010

Other

OtherConference on Lasers and Electro-Optics, CLEO 2010
CountryUnited States
CitySan Jose, CA
Period5/16/105/21/10

Fingerprint

Silica
silicon dioxide
Time measurement
Interferometry
water
Water
interferometry
time measurement

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Wang, X., Zhao, M., & Nolte, D. D. (2010). Molecular water accumulation on silica measured with picometer height resolution. In Optics InfoBase Conference Papers

Molecular water accumulation on silica measured with picometer height resolution. / Wang, Xuefeng; Zhao, Ming; Nolte, David D.

Optics InfoBase Conference Papers. 2010.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Wang, X, Zhao, M & Nolte, DD 2010, Molecular water accumulation on silica measured with picometer height resolution. in Optics InfoBase Conference Papers. Conference on Lasers and Electro-Optics, CLEO 2010, San Jose, CA, United States, 5/16/10.
Wang X, Zhao M, Nolte DD. Molecular water accumulation on silica measured with picometer height resolution. In Optics InfoBase Conference Papers. 2010
Wang, Xuefeng ; Zhao, Ming ; Nolte, David D. / Molecular water accumulation on silica measured with picometer height resolution. Optics InfoBase Conference Papers. 2010.
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