Mo/Y multilayer mirrors for the 8–12-nm wavelength region

Claude Montcalm; Brian T. Sullivan; M. Ranger; J. M. Slaughter; Patrick A. Kearney; Charles M. Falco; M. Chaker

doi:10.1364/OL.19.001004

Mo/Y multilayer mirrors for the 8–12-nm wavelength region

Claude Montcalm, Brian T. Sullivan, M. Ranger, J. M. Slaughter, Patrick A. Kearney, Charles M. Falco, M. Chaker

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.

Original language	English (US)
Pages (from-to)	1004-1006
Number of pages	3
Journal	Optics letters
Volume	19
Issue number	13
DOIs	https://doi.org/10.1364/OL.19.001004
State	Published - Jul 1994

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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10.1364/OL.19.001004

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title = "Mo/Y multilayer mirrors for the 8–12-nm wavelength region",

abstract = "Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.",

author = "Claude Montcalm and Sullivan, {Brian T.} and M. Ranger and Slaughter, {J. M.} and Kearney, {Patrick A.} and Falco, {Charles M.} and M. Chaker",

year = "1994",

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doi = "10.1364/OL.19.001004",

language = "English (US)",

volume = "19",

pages = "1004--1006",

journal = "Optics Letters",

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T1 - Mo/Y multilayer mirrors for the 8–12-nm wavelength region

AU - Montcalm, Claude

AU - Sullivan, Brian T.

AU - Ranger, M.

AU - Slaughter, J. M.

AU - Kearney, Patrick A.

AU - Falco, Charles M.

AU - Chaker, M.

PY - 1994/7

Y1 - 1994/7

N2 - Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.

AB - Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.

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JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 13

ER -

Mo/Y multilayer mirrors for the 8–12-nm wavelength region

Abstract

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