Mo/Y multilayer mirrors for the 8–12-nm wavelength region

Claude Montcalm, Brian T. Sullivan, M. Ranger, J. M. Slaughter, Patrick A. Kearney, Charles M. Falco, M. Chaker

Research output: Contribution to journalArticle

12 Scopus citations

Abstract

Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.

Original languageEnglish (US)
Pages (from-to)1004-1006
Number of pages3
JournalOptics letters
Volume19
Issue number13
DOIs
StatePublished - Jul 1994

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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    Montcalm, C., Sullivan, B. T., Ranger, M., Slaughter, J. M., Kearney, P. A., Falco, C. M., & Chaker, M. (1994). Mo/Y multilayer mirrors for the 8–12-nm wavelength region. Optics letters, 19(13), 1004-1006. https://doi.org/10.1364/OL.19.001004