Molecular Beam Epitaxy (MBE) is able to produce high purity, epitaxial multilayer films with well defined interfaces. This precise deposition control along with a number of in situ characterization instruments allows a high degree of control over the formation of multilayers. We have three MBE systems, each with characteristics suitable for a subset of possible materials, that we have used to produce a large variety of x-ray multilayers. Together these MBE systems contain Reflection High Energy Electron Diffraction (RHEED), Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), X-Ray Photoelectron Spectroscopy (XPS), Ion Scattering Spectroscopy (ISS), Secondary Ion Mass Spectroscopy (SIMS), and Scanning Tunneling Microscopy (STM). Here I provide an overview of the techniques the students, postdocs, visiting scientists, and collaborators have used to select the materials pairs we have grown and analyzed for our x-ray multilayers.