Nanolaminate structures fabricated by ALD for reducing propagation losses and enhancing the third-order optical nonlinearities

Lasse Karvonen, Tapani Alasaarela, Henri Jussila, Soroush Mehravar, Ya Chen, Antti Säynätjoki, Robert A. Norwood, Nasser Peyghambarian, Khanh Kieu, Seppo Honkanen, Harri Lipsanen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Scopus citations

Abstract

We demonstrate a novel atomic layer deposition (ALD) process to make high quality nanocrystalline titanium dioxide (TiO2) and zinc oxide (ZnO) with intermediate Al2O3 layers to limit the crystal size. The waveguide losses of TiO2/Al2O3 nanolaminates measured using the prism coupling method for both 633 nm and 1551 nm wavelengths are as low as 0.2 ± 0.1 dB/mm with the smallest crystal size. We also show that the third-order optical nonlinearity in ZnO/Al 2O3 nanolaminates can be enhanced by nanoscale engineering of the thin film structure.

Original languageEnglish (US)
Title of host publicationOptical Components and Materials XI
PublisherSPIE
ISBN (Print)9780819498953
DOIs
StatePublished - Jan 1 2014
EventOptical Components and Materials XI - San Francisco, CA, United States
Duration: Feb 3 2014Feb 5 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8982
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptical Components and Materials XI
CountryUnited States
CitySan Francisco, CA
Period2/3/142/5/14

Keywords

  • Atomic layer deposition
  • Loss
  • Third-order optical nonlinearity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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