Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes

Hiroshi Ito, Klaas Schildknegt, Eugene A. Mash

Research output: Contribution to journalConference article

9 Scopus citations

Abstract

Aqueous base developable negative deep UV resist systems composed of phenolic resins, monofunctional latent olectrophiles, and a sulfonium salt photochemical acid generator are described. This study was carried out to see whether attachment of a bulky substituent onto the phenolic group via C- or O-alkylation reduces the dissolution rate of the phenolic resin in aqueous base to provide negative images even when no crosslinking is involved in the mechanism. The latent electrophiles selected are N-hydroxymethyl and N-aceotxymethylimides as well as high-boiling aldehydes. Our matrix resins are para-, meta-, and ortho-isomers of polyvinylphenol and copolymers of p-hydroxystyrene.

Original languageEnglish (US)
Pages (from-to)408-418
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1466
StatePublished - Jan 1 1991
Externally publishedYes
EventProceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII - San Jose, CA, USA
Duration: Mar 4 1991Mar 5 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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