Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes

Hiroshi Ito, Klaas Schildknegt, Eugene A Mash

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

Aqueous base developable negative deep UV resist systems composed of phenolic resins, monofunctional latent olectrophiles, and a sulfonium salt photochemical acid generator are described. This study was carried out to see whether attachment of a bulky substituent onto the phenolic group via C- or O-alkylation reduces the dissolution rate of the phenolic resin in aqueous base to provide negative images even when no crosslinking is involved in the mechanism. The latent electrophiles selected are N-hydroxymethyl and N-aceotxymethylimides as well as high-boiling aldehydes. Our matrix resins are para-, meta-, and ortho-isomers of polyvinylphenol and copolymers of p-hydroxystyrene.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Editors Anon
PublisherPubl by Int Soc for Optical Engineering
Pages408-418
Number of pages11
Volume1466
StatePublished - 1991
Externally publishedYes
EventProceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII - San Jose, CA, USA
Duration: Mar 4 1991Mar 5 1991

Other

OtherProceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII
CitySan Jose, CA, USA
Period3/4/913/5/91

Fingerprint

phenolic resins
Phenolic resins
imides
Aldehydes
aldehydes
Amplification
alkylation
Alkylation
crosslinking
Isomers
boiling
Crosslinking
resins
Boiling liquids
attachment
copolymers
dissolving
Dissolution
generators
isomers

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Ito, H., Schildknegt, K., & Mash, E. A. (1991). Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes. In Anon (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1466, pp. 408-418). Publ by Int Soc for Optical Engineering.

Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes. / Ito, Hiroshi; Schildknegt, Klaas; Mash, Eugene A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Anon. Vol. 1466 Publ by Int Soc for Optical Engineering, 1991. p. 408-418.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ito, H, Schildknegt, K & Mash, EA 1991, Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes. in Anon (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1466, Publ by Int Soc for Optical Engineering, pp. 408-418, Proceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII, San Jose, CA, USA, 3/4/91.
Ito H, Schildknegt K, Mash EA. Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes. In Anon, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1466. Publ by Int Soc for Optical Engineering. 1991. p. 408-418
Ito, Hiroshi ; Schildknegt, Klaas ; Mash, Eugene A. / Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes. Proceedings of SPIE - The International Society for Optical Engineering. editor / Anon. Vol. 1466 Publ by Int Soc for Optical Engineering, 1991. pp. 408-418
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