Negative tone hybrid sol-gel material for electron-beam lithography

J. T. Rantala, R. S. Penner, S. Honkanen, J. Vähäkangas, M. Fallahi, N. Peyghambarian

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

A novel high-resolution sol-gel material for electron-beam lithography and direct writing of micro-optical elements is reported. A negative tone hybrid sol-gel material was synthesized and used for fabrication of submicrometer grating structures by electron-beam lithography. Doses from 10 to 100 μC/cm2 were able to crosslink the material and convert it into hybrid sol-gel glass. The sensitivity and the contrast of the material were found to be good with a linewidth of 0.5 μm.

Original languageEnglish (US)
Pages (from-to)185-187
Number of pages3
JournalThin Solid Films
Volume345
Issue number2
DOIs
StatePublished - May 21 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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