New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography

Christopher Ober, Jing Jiang, Ben Zhang, Li Li, Emmanuel Giannelis, Jun Sung Chun, Mark Neisser, Reyes Sierra-Alvares

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Scopus citations

Fingerprint

Dive into the research topics of 'New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography'. Together they form a unique fingerprint.

Physics & Astronomy

Mathematics

Engineering & Materials Science

Chemical Compounds