NORMAL INCIDENCE X-UV MIRRORS.

Charles M. Falco, Felix E. Fernandez, P. Dhez, A. Khandar-Shahabad, L. Nevot, B. Pardo, J. Corno

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

We describe the fabrication procedure as well as results of an extensive series of characterization measurements, model-fitting and synchrotron tests on Si/W multilayers designed as normal-incidence reflectors for approximately equals 200 A radiation. Characterization techniques used were low-angle diffraction, Bragg-Brentano and Seemann-Bohlin diffraction, Read camera, transmission electron microscopy and Rutherford backscattering spectroscopy. To our knowledge, this is the first time such a comprehensive set of characterization techniques has been applied to a multilayer x-ray mirror. Reflectances for approximately equals 200 A calculated using the results from these various characterization techniques are found to agree very well with measurements obtained with synchrotron radiation.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsErnst-Eckhard Koch, Guenter Schmahl
PublisherSPIE
Pages343-352
Number of pages10
ISBN (Print)0892527684
StatePublished - Dec 1 1987

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume733
ISSN (Print)0277-786X

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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