Novel process for the production of large, stable photosensitivity in glass films

Kelly Potter, Barrett G Potter, Dale C. McIntyre, Paul D. Grandon

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Germanosilicate glasses exhibit a significant photosensitive response which has been linked to the presence of oxygen-deficient germanium point defects in the glass structure. Based on this correlation, a process which produces highly photosensitive thin films without the use of hydrogen exposures, has been developed. This process, applicable to a wide range of desired xGeO 2:(1-x)SiO2 film composition, uses reactive atmosphere sputtering and allows extensive control of the degree of oxidation of the films during synthesis to produce dramatic demonstrations of photosensitivity. In preliminary tests, our films demonstrated ultraviolet-induced refractive index perturbations (Δn) of up to -4×10-3 in the visible and -0.4×10-3 at 1.5 μm. Since no hydrogen exposure was necessary, this process yielded stable films which retained their predisposition for large photosensitivity for over one year of storage.

Original languageEnglish (US)
Pages (from-to)2011
Number of pages1
JournalApplied Physics Letters
StatePublished - 1995
Externally publishedYes

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photosensitivity
glass
hydrogen
point defects
germanium
sputtering
refractivity
atmospheres
perturbation
oxidation
oxygen
synthesis
thin films

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Novel process for the production of large, stable photosensitivity in glass films. / Potter, Kelly; Potter, Barrett G; McIntyre, Dale C.; Grandon, Paul D.

In: Applied Physics Letters, 1995, p. 2011.

Research output: Contribution to journalArticle

@article{c231efb97ab849fb8dfabce9bfb57901,
title = "Novel process for the production of large, stable photosensitivity in glass films",
abstract = "Germanosilicate glasses exhibit a significant photosensitive response which has been linked to the presence of oxygen-deficient germanium point defects in the glass structure. Based on this correlation, a process which produces highly photosensitive thin films without the use of hydrogen exposures, has been developed. This process, applicable to a wide range of desired xGeO 2:(1-x)SiO2 film composition, uses reactive atmosphere sputtering and allows extensive control of the degree of oxidation of the films during synthesis to produce dramatic demonstrations of photosensitivity. In preliminary tests, our films demonstrated ultraviolet-induced refractive index perturbations (Δn) of up to -4×10-3 in the visible and -0.4×10-3 at 1.5 μm. Since no hydrogen exposure was necessary, this process yielded stable films which retained their predisposition for large photosensitivity for over one year of storage.",
author = "Kelly Potter and Potter, {Barrett G} and McIntyre, {Dale C.} and Grandon, {Paul D.}",
year = "1995",
language = "English (US)",
pages = "2011",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Novel process for the production of large, stable photosensitivity in glass films

AU - Potter, Kelly

AU - Potter, Barrett G

AU - McIntyre, Dale C.

AU - Grandon, Paul D.

PY - 1995

Y1 - 1995

N2 - Germanosilicate glasses exhibit a significant photosensitive response which has been linked to the presence of oxygen-deficient germanium point defects in the glass structure. Based on this correlation, a process which produces highly photosensitive thin films without the use of hydrogen exposures, has been developed. This process, applicable to a wide range of desired xGeO 2:(1-x)SiO2 film composition, uses reactive atmosphere sputtering and allows extensive control of the degree of oxidation of the films during synthesis to produce dramatic demonstrations of photosensitivity. In preliminary tests, our films demonstrated ultraviolet-induced refractive index perturbations (Δn) of up to -4×10-3 in the visible and -0.4×10-3 at 1.5 μm. Since no hydrogen exposure was necessary, this process yielded stable films which retained their predisposition for large photosensitivity for over one year of storage.

AB - Germanosilicate glasses exhibit a significant photosensitive response which has been linked to the presence of oxygen-deficient germanium point defects in the glass structure. Based on this correlation, a process which produces highly photosensitive thin films without the use of hydrogen exposures, has been developed. This process, applicable to a wide range of desired xGeO 2:(1-x)SiO2 film composition, uses reactive atmosphere sputtering and allows extensive control of the degree of oxidation of the films during synthesis to produce dramatic demonstrations of photosensitivity. In preliminary tests, our films demonstrated ultraviolet-induced refractive index perturbations (Δn) of up to -4×10-3 in the visible and -0.4×10-3 at 1.5 μm. Since no hydrogen exposure was necessary, this process yielded stable films which retained their predisposition for large photosensitivity for over one year of storage.

UR - http://www.scopus.com/inward/record.url?scp=36449008561&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=36449008561&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:36449008561

SP - 2011

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

ER -