On the observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films

Hung Hsi Lin, Rajat Sharma, Alex Friedman, Benjamin M. Cromey, Felipe Vallini, Matthew W. Puckett, Khanh Q Kieu, Yeshaiahu Fainman

Research output: Contribution to journalArticle

Abstract

We present experimental results on second-harmonic generation in non-stoichiometric, silicon-rich nitride films. The as-deposited film presents a second-order nonlinear coefficient, or χ (2) , as high as 8 pm/V. This value can be widely tuned using the electric field induced second harmonic effect, and a maximum value of 22.7 pm/V was achieved with this technique. We further illustrate that the second-order nonlinear coefficient exhibited by these films can be highly dispersive in nature and require further study and analysis to evaluate their viability for in-waveguide applications at telecommunication wavelengths.

Original languageEnglish (US)
Article number036101
JournalAPL Photonics
Volume4
Issue number3
DOIs
StatePublished - Mar 1 2019

Fingerprint

silicon nitrides
Nitrides
nonlinearity
Thin films
Silicon
thin films
coefficients
Harmonic generation
viability
Telecommunication
telecommunication
harmonic generations
Waveguides
Electric fields
waveguides
harmonics
Wavelength
electric fields
wavelengths

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Atomic and Molecular Physics, and Optics

Cite this

Lin, H. H., Sharma, R., Friedman, A., Cromey, B. M., Vallini, F., Puckett, M. W., ... Fainman, Y. (2019). On the observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films. APL Photonics, 4(3), [036101]. https://doi.org/10.1063/1.5053704

On the observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films. / Lin, Hung Hsi; Sharma, Rajat; Friedman, Alex; Cromey, Benjamin M.; Vallini, Felipe; Puckett, Matthew W.; Kieu, Khanh Q; Fainman, Yeshaiahu.

In: APL Photonics, Vol. 4, No. 3, 036101, 01.03.2019.

Research output: Contribution to journalArticle

Lin, HH, Sharma, R, Friedman, A, Cromey, BM, Vallini, F, Puckett, MW, Kieu, KQ & Fainman, Y 2019, 'On the observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films', APL Photonics, vol. 4, no. 3, 036101. https://doi.org/10.1063/1.5053704
Lin, Hung Hsi ; Sharma, Rajat ; Friedman, Alex ; Cromey, Benjamin M. ; Vallini, Felipe ; Puckett, Matthew W. ; Kieu, Khanh Q ; Fainman, Yeshaiahu. / On the observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films. In: APL Photonics. 2019 ; Vol. 4, No. 3.
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