Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.

Original languageEnglish (US)
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices XI
EditorsElizabeth A. Dobisz, Eva M. Campo, Louay A. Eldada
PublisherSPIE
ISBN (Electronic)9781628411973
DOIs
StatePublished - Jan 1 2014
EventNanoengineering: Fabrication, Properties, Optics, and Devices XI - San Diego, United States
Duration: Aug 19 2014Aug 20 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9170
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherNanoengineering: Fabrication, Properties, Optics, and Devices XI
CountryUnited States
CitySan Diego
Period8/19/148/20/14

Keywords

  • CMOS compatible
  • hybrid lithography
  • mask-based lithography
  • mask-less lithography
  • optical characterization

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Wang, S., Summitt, C., Johnson, L., Zaverton, M., Milster, T., & Takashima, Y. (2014). Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography. In E. A. Dobisz, E. M. Campo, & L. A. Eldada (Eds.), Nanoengineering: Fabrication, Properties, Optics, and Devices XI [91700F] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9170). SPIE. https://doi.org/10.1117/12.2062414