Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials

Charles Tarrio, Richard N. Watts, Thomas B. Lucatorto, Jon M. Slaughter, Charles M. Falco

Research output: Contribution to journalArticle

38 Scopus citations

Abstract

We have performed angle-dependent reflectance measurements of in situ magnetron sputtered films of B4C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B4C we found excellent agreement with published data. However, for Mo and W we found that the optical properties from 35 to 60 eV differed significantly from those in the literature.

Original languageEnglish (US)
Pages (from-to)4100-4104
Number of pages5
JournalApplied optics
Volume37
Issue number19
DOIs
StatePublished - Jul 1 1998

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials'. Together they form a unique fingerprint.

  • Cite this