Optical properties determination at 10.6 μm of thin semiconducting layers

C. Falco; J. Botineau; A. Azema; M. de Micheli; D. B. Ostrowsky

doi:10.1007/BF00617709

Optical properties determination at 10.6 μm of thin semiconducting layers

C. Falco, J. Botineau, A. Azema, M. de Micheli, D. B. Ostrowsky

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

An optical characterization of thin semiconducting multilayers in the infrared range, using a combination of m-lines and reflection spectroscopy techniques is exposed. Such a method, non-destructive, allows to determine the thickness and the refractive index of each component of a multilayer multimodal planar waveguide.

Original language	English (US)
Pages (from-to)	23-26
Number of pages	4
Journal	Applied Physics A Solids and Surfaces
Volume	30
Issue number	1
DOIs	https://doi.org/10.1007/BF00617709
State	Published - Jan 1 1983

Keywords

07.60
42.80

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)
Physics and Astronomy (miscellaneous)

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10.1007/BF00617709

Cite this

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title = "Optical properties determination at 10.6 μm of thin semiconducting layers",

abstract = "An optical characterization of thin semiconducting multilayers in the infrared range, using a combination of m-lines and reflection spectroscopy techniques is exposed. Such a method, non-destructive, allows to determine the thickness and the refractive index of each component of a multilayer multimodal planar waveguide.",

keywords = "07.60, 42.80",

author = "C. Falco and J. Botineau and A. Azema and {de Micheli}, M. and Ostrowsky, {D. B.}",

year = "1983",

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AU - Falco, C.

AU - Botineau, J.

AU - Azema, A.

AU - de Micheli, M.

AU - Ostrowsky, D. B.

PY - 1983/1/1

Y1 - 1983/1/1

N2 - An optical characterization of thin semiconducting multilayers in the infrared range, using a combination of m-lines and reflection spectroscopy techniques is exposed. Such a method, non-destructive, allows to determine the thickness and the refractive index of each component of a multilayer multimodal planar waveguide.

AB - An optical characterization of thin semiconducting multilayers in the infrared range, using a combination of m-lines and reflection spectroscopy techniques is exposed. Such a method, non-destructive, allows to determine the thickness and the refractive index of each component of a multilayer multimodal planar waveguide.

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KW - 42.80

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ER -

Optical properties determination at 10.6 μm of thin semiconducting layers

Abstract

Keywords

ASJC Scopus subject areas

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