Optical surfacing process optimization using parametric smoothing model for mid-to-high spatial frequency error control

Dae Wook Kim, Hubert M. Martin, James H. Burge

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

High performance optical systems aiming for very low background noise from scattering or a sharp point spread function with high encircled energy often specify their beam wavefront quality in terms of a structure function or power spectral density function, which requires a control of mid-to-high spatial frequency surface errors during the optics manufacturing process. Especially for fabrication of large aspheric optics, achieving the required surface figure irregularities over the mid-to-high spatial frequency range becomes a challenging task as the polishing lap needs to be compliant enough to conform to the varying local surface shapes under the lap. This compliance degrades the lap's smoothing capability, which relies on its rigidity. The smoothing effect corrects the mid-to-high spatial frequency errors as a polishing lap removes low spatial frequency (i.e. larger than the lap size) errors on the optical surface. Using a parametric smoothing model developed to quantitatively describe the smoothing effects during Computer Controlled Optical Surfacing (CCOS) processes, actual CCOS data from large aspheric optics fabrication projects have been analyzed and studied. The measured surface error maps were processed with the model to compare different polishing runs using various polishing parameters. The results showing the smoothing effects of mid-to-high spatial frequency surface irregularity will be presented to provide some insights for a CCOS process optimization in terms of smoothing efficiency.

Original languageEnglish (US)
Title of host publicationOptifab 2013
DOIs
StatePublished - Nov 28 2013
EventOptifab 2013 - Rochester, NY, United States
Duration: Oct 14 2013Oct 17 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8884
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptifab 2013
CountryUnited States
CityRochester, NY
Period10/14/1310/17/13

Keywords

  • Computer controlled optical surfacing
  • Mid-to-high spatial frequency error control
  • Smoothing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Optical surfacing process optimization using parametric smoothing model for mid-to-high spatial frequency error control'. Together they form a unique fingerprint.

  • Cite this

    Kim, D. W., Martin, H. M., & Burge, J. H. (2013). Optical surfacing process optimization using parametric smoothing model for mid-to-high spatial frequency error control. In Optifab 2013 [88840B] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8884). https://doi.org/10.1117/12.2028816