Optically defined multifunctional patterning of photosensitive thin-film silica mesophases

D. A. Doshi, N. K. Huesing, M. Lu, H. Fan, Y. Lu, K. Simmons-Potter, Jr Potter, A. J. Hurd, C. J. Brinker

Research output: Contribution to journalArticlepeer-review

180 Scopus citations

Abstract

Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed sitoxane condensation, which can be used for selective etching of unexposed regions; for 'gray-scale' patterning of refractive index, pore size, surface area, and wetting behavior, and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.

Original languageEnglish (US)
Pages (from-to)107-111
Number of pages5
JournalScience
Volume290
Issue number5489
DOIs
StatePublished - Oct 6 2000
Externally publishedYes

ASJC Scopus subject areas

  • General

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