Aspheric optical surfaces are often tested using computer-generated holograms (CGHs). The etching of the CGH pattern must be highly accurate to create desired wavefronts. Variations of line width, etching depth, and surface roughness cause unwanted wavefront errors. The sensitivity to these manufacturing errors is studied using scalar diffraction analysis. We provide a parametric model that can be used for optimizing the CGH design to give good diffraction efficiency and limited sensitivity to manufacturing errors.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics