Optimal design of computer-generated holograms to minimize sensitivity to fabrication errors

Research output: Contribution to journalArticle

27 Scopus citations

Abstract

Aspheric optical surfaces are often tested using computer-generated holograms (CGHs). The etching of the CGH pattern must be highly accurate to create desired wavefronts. Variations of line width, etching depth, and surface roughness cause unwanted wavefront errors. The sensitivity to these manufacturing errors is studied using scalar diffraction analysis. We provide a parametric model that can be used for optimizing the CGH design to give good diffraction efficiency and limited sensitivity to manufacturing errors.

Original languageEnglish (US)
Pages (from-to)15410-15417
Number of pages8
JournalOptics Express
Volume15
Issue number23
DOIs
StatePublished - Nov 12 2007

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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