Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek S. Keyes, Thiago S. Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young Sik Kim, Gun Hee Kim, Thomas D. Milster

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

By utilizing the Hydrogen-Lyman-α (HLA) source at 121.6 nm, we hope to achieve an intrinsic resolution of 247 nm at 0.3 numerical aperture (NA) and 92 nm at 0.8 NA. The motivation for 121.6 nm microscopy is the existence of a transparent window in the air absorption spectrum at that wavelength, which allows for the sample to be in air while the microscope is in an enclosed nitrogen environment. The microscope objective consists of two reflective optics and a LiF window, and it has been designed to demonstrate diffraction limited performance over a 160 μm full field at 121.6 nm. The optomechanical design consists of mechanical subcells for each optical component, precision spacers and a barrel bore, which allow for submicron control of tolerance parameters.

Original languageEnglish (US)
Title of host publicationOptical Manufacturing and Testing XI
EditorsRay Williamson, Oliver W. Fahnle, Dae Wook Kim
PublisherSPIE
ISBN (Electronic)9781628417418
DOIs
StatePublished - 2015
EventOptical Manufacturing and Testing XI - San Diego, United States
Duration: Aug 9 2015Aug 11 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9575
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherOptical Manufacturing and Testing XI
CountryUnited States
CitySan Diego
Period8/9/158/11/15

Keywords

  • Hydrogen-Lyman-α
  • Microscopy
  • Optical alignment
  • Optomechanics
  • Vacuum ultraviolet

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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