Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek S. Keyes, Thiago S. Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young Sik Kim, Gun Hee Kim, Thomas D Milster

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

By utilizing the Hydrogen-Lyman-α (HLA) source at 121.6 nm, we hope to achieve an intrinsic resolution of 247 nm at 0.3 numerical aperture (NA) and 92 nm at 0.8 NA. The motivation for 121.6 nm microscopy is the existence of a transparent window in the air absorption spectrum at that wavelength, which allows for the sample to be in air while the microscope is in an enclosed nitrogen environment. The microscope objective consists of two reflective optics and a LiF window, and it has been designed to demonstrate diffraction limited performance over a 160 μm full field at 121.6 nm. The optomechanical design consists of mechanical subcells for each optical component, precision spacers and a barrel bore, which allow for submicron control of tolerance parameters.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume9575
ISBN (Print)9781628417418
DOIs
StatePublished - 2015
EventOptical Manufacturing and Testing XI - San Diego, United States
Duration: Aug 9 2015Aug 11 2015

Other

OtherOptical Manufacturing and Testing XI
CountryUnited States
CitySan Diego
Period8/9/158/11/15

Fingerprint

numerical aperture
Microscope
Tolerance
Microscopes
microscopes
air
Absorption Spectra
Air
Microscopy
spacers
Nitrogen
Hydrogen
Diffraction
Optics
Absorption spectra
Microscopic examination
optics
Wavelength
microscopy
absorption spectra

Keywords

  • Hydrogen-Lyman-α
  • Microscopy
  • Optical alignment
  • Optomechanics
  • Vacuum ultraviolet

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Keyes, D. S., Jota, T. S., Gao, W., Luepke, D., Densmore, V., Kim, Y. S., ... Milster, T. D. (2015). Optomechanical design and tolerance of a microscope objective at 121.6 nm. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 9575). [957506] SPIE. https://doi.org/10.1117/12.2188803

Optomechanical design and tolerance of a microscope objective at 121.6 nm. / Keyes, Derek S.; Jota, Thiago S.; Gao, Weichuan; Luepke, Dakota; Densmore, Victor; Kim, Young Sik; Kim, Gun Hee; Milster, Thomas D.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9575 SPIE, 2015. 957506.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Keyes, DS, Jota, TS, Gao, W, Luepke, D, Densmore, V, Kim, YS, Kim, GH & Milster, TD 2015, Optomechanical design and tolerance of a microscope objective at 121.6 nm. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 9575, 957506, SPIE, Optical Manufacturing and Testing XI, San Diego, United States, 8/9/15. https://doi.org/10.1117/12.2188803
Keyes DS, Jota TS, Gao W, Luepke D, Densmore V, Kim YS et al. Optomechanical design and tolerance of a microscope objective at 121.6 nm. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9575. SPIE. 2015. 957506 https://doi.org/10.1117/12.2188803
Keyes, Derek S. ; Jota, Thiago S. ; Gao, Weichuan ; Luepke, Dakota ; Densmore, Victor ; Kim, Young Sik ; Kim, Gun Hee ; Milster, Thomas D. / Optomechanical design and tolerance of a microscope objective at 121.6 nm. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9575 SPIE, 2015.
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