Orthonormal vector polynomials in a unit circle, application: Fitting mapping distortions in a null test

Chunyu Zhao, James H. Burge

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Scopus citations

Abstract

We developed a complete and orthonormal set of vector polynomials defined over a unit circle. One application of these vector polynomials is for fitting the mapping distortions in an interferometric null test. This paper discusses the source of the mapping distortions and the approach of fitting the mapping relations, and justifies why the set of vector polynomials is the appropriate choice for this purpose. Examples are given to show the excellent fitting results with the polynomials.

Original languageEnglish (US)
Title of host publicationOptical Manufacturing and Testing VIII
DOIs
StatePublished - Oct 19 2009
EventOptical Manufacturing and Testing VIII - San Diego, CA, United States
Duration: Aug 4 2009Aug 5 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7426
ISSN (Print)0277-786X

Other

OtherOptical Manufacturing and Testing VIII
CountryUnited States
CitySan Diego, CA
Period8/4/098/5/09

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Keywords

  • Aberration
  • Mapping distortion
  • Optical testing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Zhao, C., & Burge, J. H. (2009). Orthonormal vector polynomials in a unit circle, application: Fitting mapping distortions in a null test. In Optical Manufacturing and Testing VIII [74260V] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7426). https://doi.org/10.1117/12.828288