Parallel fabrication of magnetic tunnel junction nanopillars by nanosphere lithography

W. G. Wang, A. Pearse, M. Li, S. Hageman, A. X. Chen, F. Q. Zhu, C. L. Chien

Research output: Contribution to journalArticle

8 Scopus citations

Abstract

We present a new method for fabricating magnetic tunnel junction nanopillars that uses polystyrene nanospheres as a lithographic template. Unlike the common approaches, which depend on electron beam lithography to sequentially fabricate each nanopillar, this method is capable of patterning a large number of nanopillars simultaneously. Both random and ordered nanosphere patterns have been explored for fabricating high quality tunneling junctions with magnetoresistance in excess of 100%, employing ferromagnetic layers with both out-of-plane and in-plane easy axis. Novel voltage induced switching has been observed in these structures. This method provides a cost-effective way of rapidly fabricating a large number of tunnel junction nanopillars in parallel.

Original languageEnglish (US)
Article number1948
JournalScientific reports
Volume3
DOIs
StatePublished - Jun 6 2013
Externally publishedYes

ASJC Scopus subject areas

  • General

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