Passive Wireless Monitoring of Wafer Cleanliness during Rinsing of Semiconductor Wafers

Xu Zhang, Jun Yan, Bert Vermeire, Farhang Shadman, Junseok Chae

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Semiconductor facilities consume large amounts of water, most of which is used for rinsing of wafers during cleaning steps. To optimize water use, real-time and in situ monitoring of wafer cleanliness during rinsing is necessary. Yet no prior art is real-time and in situ. In this paper, we present a passive wireless sensing system capable of measuring the residual contamination on the wafers in real-time and in situ. The wireless system consists of a micromachined Electro-Chemical Residue Sensor (ECRS) and wireless transponder circuitry based on RFID technology. The ECRS measures the impurities concentration of the water inside micro-features during the rinsing processes. The sensor reading is converted to a frequency by the on-wafer transponder and remotely logged through a wireless link between two coupled inductors, while the transponder captures power from the remote RF signal: a battery-free system. A prototype system was fabricated and its frequency output was characterized by using sodium chloride solution ranging from 190 ppb to 6 ppm. The measured wireless chemical sensor system has a relative uncertainty of less than 1% in the concentration range.

Original languageEnglish (US)
Article number5443714
Pages (from-to)1048-1055
Number of pages8
JournalIEEE Sensors Journal
Volume10
Issue number6
DOIs
StatePublished - 2010

Fingerprint

cleanliness
transponders
wafers
Transponders
Semiconductor materials
Monitoring
sensors
water
Sensors
arts
inductors
sodium chlorides
Water
cleaning
electric batteries
Sodium chloride
contamination
Chemical sensors
Radio frequency identification (RFID)
prototypes

Keywords

  • Passive sensing
  • Rinsing monitoring
  • Wafer rinse
  • Water saving
  • Wireless sensing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Instrumentation

Cite this

Passive Wireless Monitoring of Wafer Cleanliness during Rinsing of Semiconductor Wafers. / Zhang, Xu; Yan, Jun; Vermeire, Bert; Shadman, Farhang; Chae, Junseok.

In: IEEE Sensors Journal, Vol. 10, No. 6, 5443714, 2010, p. 1048-1055.

Research output: Contribution to journalArticle

Zhang, Xu ; Yan, Jun ; Vermeire, Bert ; Shadman, Farhang ; Chae, Junseok. / Passive Wireless Monitoring of Wafer Cleanliness during Rinsing of Semiconductor Wafers. In: IEEE Sensors Journal. 2010 ; Vol. 10, No. 6. pp. 1048-1055.
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