Pattern evolution in shallow trench isolation chemical mechanical planarization via real-time shear and down forces spectral analyses

Yasa Sampurno, Fransisca Sudargho, Yun Zhuang, Toranosuke Ashizawa, Hiroyuki Morishima, Ara Philipossian

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy