Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications

D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, M. G. Young

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Fingerprint

Dive into the research topics of 'Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science

Chemical Compounds