Phase-induced amplitude apodization complex mask coronagraph tolerancing and analysis

Justin M. Knight, Olivier Guyon, Julien Lozi, Nemanja Jovanovic, Jared R. Males

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Phase-Induced Amplitude Apodization Complex Mask Coronagraphs (PIAACMC) ofier high-contrast perfor- mance at a small inner-working angle (< 1 /D) with high planet throughput (> 70%). The complex mask is a multi-zone, phase-shifting mask comprised of tiled hexagons which vary in depth. Complex masks can be dificult to fabricate as there are many micron-scale hexagonal zones (> 500 on average) with continuous depths ranging over a few microns. Ensuring the broadband PIAACMC design performance carries through to fabricated devices requires that these complex masks are manufactured to within well-defined tolerances. We report on a simulated tolerance analysis of a toy" PIAACMC design which characterizes the efiect of common microfabrication errors on on-axis contrast performance using a simple Monte Carlo method. Moreover, the tolerance analysis provides crucial information for choosing a fabrication process which yields working devices while potentially reducing process complexity. The common fabrication errors investigated are zone depth discretization, zone depth errors, and edge artifacts between zones.

Original languageEnglish (US)
Title of host publicationAdvances in Optical and Mechanical Technologies for Telescopes and Instrumentation III
EditorsRoland Geyl, Ramon Navarro
PublisherSPIE
ISBN (Print)9781510619654
DOIs
StatePublished - 2018
EventAdvances in Optical and Mechanical Technologies for Telescopes and Instrumentation III 2018 - Austin, United States
Duration: Jun 10 2018Jun 15 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10706
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAdvances in Optical and Mechanical Technologies for Telescopes and Instrumentation III 2018
CountryUnited States
CityAustin
Period6/10/186/15/18

Keywords

  • Focal plane mask
  • Monte carlo
  • Piaacmc
  • Stellar coronagraph
  • Tolerancing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Knight, J. M., Guyon, O., Lozi, J., Jovanovic, N., & Males, J. R. (2018). Phase-induced amplitude apodization complex mask coronagraph tolerancing and analysis. In R. Geyl, & R. Navarro (Eds.), Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III [107065O] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10706). SPIE. https://doi.org/10.1117/12.2314139