Photo-induced deposition of nanostructured thin films by UV-exposure of heteroleptic Ti-alkoxide solutions

J. David Musgraves, B. G. Potter, Timothy J. Boyle

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Photodeposited physical relief structures have been formed via the UV-irradiation of solutions of the heteroleptic titanium alkoxide, (OPy) 2Ti(TAP)2. Raman studies of the films produced confirm the photoinitiation of hydrolysis and condensation reactions in the molecular structure, leading to the development of an insoluble solid phase. Using a shadow mask technique, these films were deposited directly from solution with microscale patterning and their structure and properties were studied as a function of both irradiation conditions (UV-fluence and intensity) as well as precursor solution chemistry (water content). Variations in nanostructure are visible in scanning electron micrographs, with a higher solution water content producing a more condensed, i.e. less porous, film.

Original languageEnglish (US)
Title of host publicationSynthesis and Metrology of Nanoscale Oxides and Thin Films
PublisherMaterials Research Society
Pages64-70
Number of pages7
ISBN (Print)9781605608556
DOIs
StatePublished - Jan 1 2008
Event2008 MRS Spring Meeting - San Francisco, CA, United States
Duration: Mar 24 2008Mar 28 2008

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1074
ISSN (Print)0272-9172

Other

Other2008 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period3/24/083/28/08

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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