Photoelectrochemical and spectroscopic characterization of thin films of titanyl phthalocyanine: Comparisons with vanadyl phthalocyanine

T. J. Klofta, J. Danziger, P. Lee, J. Pankow, K. W. Nebesny, Neal R Armstrong

Research output: Contribution to journalArticle

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Abstract

The photoelectrochemical properties of vacuum-deposited thin films of titanyl phthalocyanine (TiOPc) are described. Continuous films between 60 and 400 nm in thickness show behavior like that of a highly doped p-type semiconductor, with open-circuit photopotentials (Voc) that vary linearly in magnitude with the formal potential of the contacting redox couple (up to 0.7 V). Comparison of photocurrent action spectra and transmission absorbance spectra showed that two distinct phases of TiOPc were deposited from vacuum, having different absorbance maxima at ca. 720 and 820 nm. The TiOPc phase with the more red-shifted absorbance appeared to possess higher photoactivity. X-ray photoelectron spectroscopy (XPS) of both TiOPc and vanadyl phthalocyanine films (VOPc) showed clearly the presence of extra oxygen forms for films vacuum deposited in moderate (10-6 Torr) vacuums, as opposed to the stoichiometric quantities of oxygen found in films deposited under ultrahigh vacuum.

Original languageEnglish (US)
Pages (from-to)5646-5651
Number of pages6
JournalJournal of Physical Chemistry
Volume91
Issue number22
StatePublished - 1987

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Vanadates
Vacuum
Thin films
vacuum
thin films
Oxygen
p-type semiconductors
Ultrahigh vacuum
oxygen
Photocurrents
ultrahigh vacuum
photocurrents
X ray photoelectron spectroscopy
photoelectron spectroscopy
Semiconductor materials
phthalocyanine
Networks (circuits)
x rays

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

Cite this

Photoelectrochemical and spectroscopic characterization of thin films of titanyl phthalocyanine : Comparisons with vanadyl phthalocyanine. / Klofta, T. J.; Danziger, J.; Lee, P.; Pankow, J.; Nebesny, K. W.; Armstrong, Neal R.

In: Journal of Physical Chemistry, Vol. 91, No. 22, 1987, p. 5646-5651.

Research output: Contribution to journalArticle

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AU - Klofta, T. J.

AU - Danziger, J.

AU - Lee, P.

AU - Pankow, J.

AU - Nebesny, K. W.

AU - Armstrong, Neal R

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N2 - The photoelectrochemical properties of vacuum-deposited thin films of titanyl phthalocyanine (TiOPc) are described. Continuous films between 60 and 400 nm in thickness show behavior like that of a highly doped p-type semiconductor, with open-circuit photopotentials (Voc) that vary linearly in magnitude with the formal potential of the contacting redox couple (up to 0.7 V). Comparison of photocurrent action spectra and transmission absorbance spectra showed that two distinct phases of TiOPc were deposited from vacuum, having different absorbance maxima at ca. 720 and 820 nm. The TiOPc phase with the more red-shifted absorbance appeared to possess higher photoactivity. X-ray photoelectron spectroscopy (XPS) of both TiOPc and vanadyl phthalocyanine films (VOPc) showed clearly the presence of extra oxygen forms for films vacuum deposited in moderate (10-6 Torr) vacuums, as opposed to the stoichiometric quantities of oxygen found in films deposited under ultrahigh vacuum.

AB - The photoelectrochemical properties of vacuum-deposited thin films of titanyl phthalocyanine (TiOPc) are described. Continuous films between 60 and 400 nm in thickness show behavior like that of a highly doped p-type semiconductor, with open-circuit photopotentials (Voc) that vary linearly in magnitude with the formal potential of the contacting redox couple (up to 0.7 V). Comparison of photocurrent action spectra and transmission absorbance spectra showed that two distinct phases of TiOPc were deposited from vacuum, having different absorbance maxima at ca. 720 and 820 nm. The TiOPc phase with the more red-shifted absorbance appeared to possess higher photoactivity. X-ray photoelectron spectroscopy (XPS) of both TiOPc and vanadyl phthalocyanine films (VOPc) showed clearly the presence of extra oxygen forms for films vacuum deposited in moderate (10-6 Torr) vacuums, as opposed to the stoichiometric quantities of oxygen found in films deposited under ultrahigh vacuum.

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