Photolabile dendrimers using o-nitrobenzyl ether linkages

Mario Smet, Li Xin Liao, Wim Dehaen, Dominic V Mcgrath

Research output: Contribution to journalArticle

53 Citations (Scopus)

Abstract

(Formula presented) Benzyl aryl ether dendrimers containing photosensitive, veratryl-based o-nitrobenzyl AB linkages (bold bonds) were prepared to the third generation and shown to undergo site-specific degradation when irradiated with ultraviolet light.

Original languageEnglish (US)
Pages (from-to)511-512
Number of pages2
JournalOrganic Letters
Volume2
Issue number4
StatePublished - Feb 24 2000

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Dendrimers
dendrimers
Ultraviolet Rays
linkages
ultraviolet radiation
Ether
ethers
degradation
Degradation

ASJC Scopus subject areas

  • Molecular Medicine

Cite this

Smet, M., Liao, L. X., Dehaen, W., & Mcgrath, D. V. (2000). Photolabile dendrimers using o-nitrobenzyl ether linkages. Organic Letters, 2(4), 511-512.

Photolabile dendrimers using o-nitrobenzyl ether linkages. / Smet, Mario; Liao, Li Xin; Dehaen, Wim; Mcgrath, Dominic V.

In: Organic Letters, Vol. 2, No. 4, 24.02.2000, p. 511-512.

Research output: Contribution to journalArticle

Smet, M, Liao, LX, Dehaen, W & Mcgrath, DV 2000, 'Photolabile dendrimers using o-nitrobenzyl ether linkages', Organic Letters, vol. 2, no. 4, pp. 511-512.
Smet M, Liao LX, Dehaen W, Mcgrath DV. Photolabile dendrimers using o-nitrobenzyl ether linkages. Organic Letters. 2000 Feb 24;2(4):511-512.
Smet, Mario ; Liao, Li Xin ; Dehaen, Wim ; Mcgrath, Dominic V. / Photolabile dendrimers using o-nitrobenzyl ether linkages. In: Organic Letters. 2000 ; Vol. 2, No. 4. pp. 511-512.
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