Photopatternable sol-gel for compound semiconductor processing

Mahmoud Fallahi, Robert Bedford, Dong Lu

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

An overview is given of several features of hybrid inorganic-organic sol-gel for compound semiconductor processing. Hybrid sol-gel films, with dual organic-inorganic properties, can be easily spin-coated and photopatterned on semiconductor substrates and used as the dielectric masking layer for dry etching of semiconductor compounds such as GaAs and InP. Planarization capabilities of the hybrid sol-gels on deep mesas are also demonstrated.

Original languageEnglish (US)
Pages (from-to)2942-2945
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number6
DOIs
StatePublished - Nov 2002

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Sol-gels
gels
Semiconductor materials
Processing
Dry etching
mesas
masking
etching
Substrates

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Photopatternable sol-gel for compound semiconductor processing. / Fallahi, Mahmoud; Bedford, Robert; Lu, Dong.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 20, No. 6, 11.2002, p. 2942-2945.

Research output: Contribution to journalArticle

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