Photosensitivity in germano-silicate sol-gel thin films

Kelly Potter, George I. Stegeman, Barrett G Potter, Joseph H. Simmons

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

Binary germano-silicate thin-film waveguides were produced by the sol-gel method with 10, 25 and 45 mol% GeO2. Post-depositin, reducing-atmosphere heat treatments were used to induce a variety of photosensitive defects in the films. The waveguides were subsequently exposed to guided counter-propagating beams at 488 nm to seed and grow permanent optical gratings. The mechanisms of defect formation and bleaching following exposure at 488 and at 248 nm are analyzed, and the role of these mechanisms in developing photosensitivity is elucidated. New photo-induced absorptive processes are observed and related to the optical behavior. Models for photosensitivity are reviewed in light of these observations.

Original languageEnglish (US)
Pages (from-to)254-259
Number of pages6
JournalJournal of Non-Crystalline Solids
Volume179
Issue numberC
DOIs
StatePublished - Nov 4 1994
Externally publishedYes

Fingerprint

Silicates
Photosensitivity
photosensitivity
Sol-gels
silicates
Waveguides
gels
waveguides
Thin films
Defects
defects
Diffraction gratings
bleaching
Bleaching
thin films
Sol-gel process
Seed
seeds
counters
heat treatment

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Photosensitivity in germano-silicate sol-gel thin films. / Potter, Kelly; Stegeman, George I.; Potter, Barrett G; Simmons, Joseph H.

In: Journal of Non-Crystalline Solids, Vol. 179, No. C, 04.11.1994, p. 254-259.

Research output: Contribution to journalArticle

Potter, Kelly ; Stegeman, George I. ; Potter, Barrett G ; Simmons, Joseph H. / Photosensitivity in germano-silicate sol-gel thin films. In: Journal of Non-Crystalline Solids. 1994 ; Vol. 179, No. C. pp. 254-259.
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