Plasma lithography for control of cell morphology and proliferation

Michael Junkin, Donna Zhang, Pak Kin Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have utilized a plasma based patterning technique [1], that we have developed, to study the effects of micrometer and submicrometer scale surface functionalization on cell proliferation and morphology. We have applied this method to cellular patterning and examined the response of mammalian cells to patterns of hydrophobic and hydrophilic areas created directly on polystyrene substrates. We have observed that the residual plasma pattern can serve as a template for cell attachment and growth on patterns at line widths -22 Jμm and larger. At smaller sizes, cells do not align themselves with the pattern, but their growth is affected and is significantly less than on homogeneous hydrophilic polystyrene surfaces. This type of patterning could have several uses including tissue engineering, medical implants, or providing a means for studying the fundamental behavior of cell to surface and other interactions.

Original languageEnglish (US)
Title of host publication4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
Pages822-826
Number of pages5
DOIs
StatePublished - 2009
Event4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009 - Shenzhen, China
Duration: Jan 5 2009Jan 8 2009

Other

Other4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
CountryChina
CityShenzhen
Period1/5/091/8/09

Fingerprint

Lithography
Plasmas
Polystyrenes
Cells
Cell proliferation
Tissue engineering
Linewidth
Substrates

Keywords

  • Cellular patterning
  • Plasma lithography
  • Surface patterning
  • Tissue engineering

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Junkin, M., Zhang, D., & Wong, P. K. (2009). Plasma lithography for control of cell morphology and proliferation. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009 (pp. 822-826). [5068703] https://doi.org/10.1109/NEMS.2009.5068703

Plasma lithography for control of cell morphology and proliferation. / Junkin, Michael; Zhang, Donna; Wong, Pak Kin.

4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009. 2009. p. 822-826 5068703.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Junkin, M, Zhang, D & Wong, PK 2009, Plasma lithography for control of cell morphology and proliferation. in 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009., 5068703, pp. 822-826, 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009, Shenzhen, China, 1/5/09. https://doi.org/10.1109/NEMS.2009.5068703
Junkin M, Zhang D, Wong PK. Plasma lithography for control of cell morphology and proliferation. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009. 2009. p. 822-826. 5068703 https://doi.org/10.1109/NEMS.2009.5068703
Junkin, Michael ; Zhang, Donna ; Wong, Pak Kin. / Plasma lithography for control of cell morphology and proliferation. 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009. 2009. pp. 822-826
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