Polarization aberrations. 1. Rotationally symmetric optical systems

Russell A Chipman, Russell A. Chipman

Research output: Contribution to journalArticle

74 Citations (Scopus)

Abstract

This paper presents the development of a formulation that takes into consideration phase-amplitude, linear diattenuation, and linear retardance effects of thin-film coatings on lenses and mirrors in aberration theory. Specifically, a discussion and calculation of an exponential expansion of the polarization aberrations for the case of strong polarization aberrations through fourth order, is described and applied to the understanding of polarization ray-tracing results. The theory is applicable to a variety of existing optical systems and for integration of thin-film design and optical design for optical systems that are polarization-sensitive.

Original languageEnglish (US)
Pages (from-to)5080-5100
Number of pages21
JournalApplied Optics
Volume33
Issue number22
StatePublished - Aug 1 1994
Externally publishedYes

Fingerprint

Aberrations
Optical systems
aberration
Polarization
polarization
Thin films
Optical design
Ray tracing
thin films
ray tracing
Lenses
lenses
mirrors
coatings
formulations
Coatings
expansion

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Polarization aberrations. 1. Rotationally symmetric optical systems. / Chipman, Russell A; Chipman, Russell A.

In: Applied Optics, Vol. 33, No. 22, 01.08.1994, p. 5080-5100.

Research output: Contribution to journalArticle

Chipman, Russell A ; Chipman, Russell A. / Polarization aberrations. 1. Rotationally symmetric optical systems. In: Applied Optics. 1994 ; Vol. 33, No. 22. pp. 5080-5100.
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