@inproceedings{864532ef6bd045978761ad6a6fddae8e,
title = "Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners",
abstract = "The functional form of coating-induced polarization aberrations in EUV lithography systems is evaluated through polarization ray tracing of an example 3×EUV scanner with state-of-the-art graded multilayer coatings. In particular, the impact of coating-induced on-axis astigmatism, as well as diattenuation and retardance on image quality are investigated. The point spread function (PSF) consists of four polarization-dependent components: two are nearly diffraction limited and two are highly apodized, and all components can be described by a Mueller matrix Point Spread Matrix (PSM). The highly apodized components are {"}ghost{"} images that are larger than the diffraction limit, reducing image contrast and resolution.",
keywords = "EUV, lithography, multilayer thin film coatings, polarization aberrations, polarization ray tracing",
author = "Jota, {Thiago S.} and Chipman, {Russell A.}",
note = "Publisher Copyright: {\textcopyright} 2016 SPIE. Copyright: Copyright 2016 Elsevier B.V., All rights reserved.; Extreme Ultraviolet (EUV) Lithography VII ; Conference date: 22-02-2016 Through 25-02-2016",
year = "2016",
doi = "10.1117/12.2218918",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Panning, {Eric M.} and Goldberg, {Kenneth A.}",
booktitle = "Extreme Ultraviolet (EUV) Lithography VII",
}