Polarization aberrations induced by graded multilayer coatings in EUV lithography

Thiago S. Jota, Russell A. Chipman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Polarization aberrations in EUVL systems are evaluated via polarization ray tracing of an example system. Coating optimization and coating-induced polarization aberrations, diattenuation, and retardance on image quality are investigated.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2016
PublisherOSA - The Optical Society
ISBN (Print)9781943580132
DOIs
StatePublished - Jan 1 2016
EventOptical Interference Coatings, OIC 2016 - Tucson, United States
Duration: Jun 19 2016Jun 24 2016

Publication series

NameOptics InfoBase Conference Papers

Other

OtherOptical Interference Coatings, OIC 2016
CountryUnited States
CityTucson
Period6/19/166/24/16

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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  • Cite this

    Jota, T. S., & Chipman, R. A. (2016). Polarization aberrations induced by graded multilayer coatings in EUV lithography. In Optical Interference Coatings, OIC 2016 (Optics InfoBase Conference Papers). OSA - The Optical Society. https://doi.org/10.1364/oic.2016.ta.5