Polarization holograms for source-mask optimization

T. D. Milster, H. Noble, E. Ford, W. Dallas, R. A. Chipman, I. Matsubara, Y. Unno, S. McClain, P. Khulbe, W. S.T. Lam, D. Hansen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

Original languageEnglish (US)
Title of host publicationOptical Microlithography XXIV
DOIs
StatePublished - Jun 22 2011
EventOptical Microlithography XXIV - San Jose, CA, United States
Duration: Mar 1 2011Mar 3 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7973
ISSN (Print)0277-786X

Other

OtherOptical Microlithography XXIV
CountryUnited States
CitySan Jose, CA
Period3/1/113/3/11

Keywords

  • Computer generated hologram
  • Diffractive optical element
  • Illumination
  • Lithography
  • Polarization
  • Projection camera
  • Source-mask optimization

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Milster, T. D., Noble, H., Ford, E., Dallas, W., Chipman, R. A., Matsubara, I., Unno, Y., McClain, S., Khulbe, P., Lam, W. S. T., & Hansen, D. (2011). Polarization holograms for source-mask optimization. In Optical Microlithography XXIV [79731A] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7973). https://doi.org/10.1117/12.879534