Polarization independent and low loss laser written polysiloxane interconnect building blocks

A. Lopez-Santiago, Palash Gangopadhyay, A. Bablumyan, R. Voorakaranam, K. Takeuchi, D. J. Deohazer, Robert A Norwood, Nasser N Peyghambarian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Single-mode polysiloxane based waveguides and directional couplers, key optical interconnect building blocks, were fabricated using direct laser writing. Key performance parameters include polarization independent propagation loss of 0.23 dB/cm and a possible wafer scale fabrication.

Original languageEnglish (US)
Title of host publication2013 Optical Interconnects Conference, OI 2013
Pages66-67
Number of pages2
DOIs
Publication statusPublished - 2013
Event2013 IEEE Optical Interconnects Conference, OI 2013 - Santa Fe, NM, United States
Duration: May 5 2013May 8 2013

Other

Other2013 IEEE Optical Interconnects Conference, OI 2013
CountryUnited States
CitySanta Fe, NM
Period5/5/135/8/13

    Fingerprint

Keywords

  • Direct laser writing
  • optical interconnects
  • polymer waveguide

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electronic, Optical and Magnetic Materials

Cite this

Lopez-Santiago, A., Gangopadhyay, P., Bablumyan, A., Voorakaranam, R., Takeuchi, K., Deohazer, D. J., ... Peyghambarian, N. N. (2013). Polarization independent and low loss laser written polysiloxane interconnect building blocks. In 2013 Optical Interconnects Conference, OI 2013 (pp. 66-67). [6552926] https://doi.org/10.1109/OIC.2013.6552926