Presence of stochastic process variations based analysis of crosstalk of non-uniform RLC interconnects

Xin Li, Janet M. Wang, Wei Qing Tang, Hui Zhong Wu, Ying Zhang

Research output: Contribution to journalArticle

Abstract

A new method was proposed for the analysis of crosstalk of non-uniform RLC interconnects with stochastic process variations, and a stochastic perturbation model was proposed. The coupled non-uniform interconnects were decoupled into two independent interconnects, so the process of analysis was abbreviated. A new approximation model was used to approximate the digital results and the precision was improved. Finally, for expanding the size of circuit, this method was expanded to the case of more coupled interconnects. Experimental results show that the proposed method can evaluate the crosstalk of non-uniform interconnects effectively.

Original languageEnglish (US)
Pages (from-to)1876-1879+1933
JournalXitong Fangzhen Xuebao / Journal of System Simulation
Volume20
Issue number7
StatePublished - Apr 5 2008

Keywords

  • Complex fitting
  • Decoupling
  • Non-uniform interconnects
  • RLC model
  • Stochastic perturbation

ASJC Scopus subject areas

  • Modeling and Simulation
  • Aerospace Engineering
  • Computer Science Applications

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