Abstract
Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 51-53 |
| Number of pages | 3 |
| Journal | Superlattices and Microstructures |
| Volume | 4 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1988 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
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Properties of multilayers for soft X-ray optics. / Falco, Charles M; Fernandez, Felix E.; Dhez, P.; Khandar-Shahabad, A.
In: Superlattices and Microstructures, Vol. 4, No. 1, 1988, p. 51-53.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Properties of multilayers for soft X-ray optics
AU - Falco, Charles M
AU - Fernandez, Felix E.
AU - Dhez, P.
AU - Khandar-Shahabad, A.
PY - 1988
Y1 - 1988
N2 - Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.
AB - Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.
UR - http://www.scopus.com/inward/record.url?scp=0023572570&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0023572570&partnerID=8YFLogxK
U2 - 10.1016/0749-6036(88)90266-2
DO - 10.1016/0749-6036(88)90266-2
M3 - Article
AN - SCOPUS:0023572570
VL - 4
SP - 51
EP - 53
JO - Superlattices and Microstructures
JF - Superlattices and Microstructures
SN - 0749-6036
IS - 1
ER -