Properties of multilayers for soft X-ray optics

Charles M. Falco; Felix E. Fernandez; P. Dhez; A. Khandar-Shahabad

doi:10.1016/0749-6036(88)90266-2

Properties of multilayers for soft X-ray optics

Charles M. Falco, Felix E. Fernandez, P. Dhez, A. Khandar-Shahabad

Optical Sciences, College of

Research output: Contribution to journal › Article

2 Scopus citations

Abstract

Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.

Original language	English (US)
Pages (from-to)	51-53
Number of pages	3
Journal	Superlattices and Microstructures
Volume	4
Issue number	1
DOIs	https://doi.org/10.1016/0749-6036(88)90266-2
State	Published - 1988

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Electrical and Electronic Engineering

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Falco, C. M., Fernandez, F. E., Dhez, P., & Khandar-Shahabad, A. (1988). Properties of multilayers for soft X-ray optics. Superlattices and Microstructures, 4(1), 51-53. https://doi.org/10.1016/0749-6036(88)90266-2

@article{c4f4e73b74ef43de96accc1ed8cedf8e,

title = "Properties of multilayers for soft X-ray optics",

abstract = "Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.",

author = "Falco, {Charles M.} and Fernandez, {Felix E.} and P. Dhez and A. Khandar-Shahabad",

year = "1988",

doi = "10.1016/0749-6036(88)90266-2",

language = "English (US)",

volume = "4",

pages = "51--53",

journal = "Superlattices and Microstructures",

issn = "0749-6036",

publisher = "Academic Press Inc.",

number = "1",

}

TY - JOUR

T1 - Properties of multilayers for soft X-ray optics

AU - Falco, Charles M.

AU - Fernandez, Felix E.

AU - Dhez, P.

AU - Khandar-Shahabad, A.

PY - 1988

Y1 - 1988

N2 - Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.

AB - Appropriate physical description of multilayer structures to be used as soft x-ray optical elements is necessary to ensure agreement of predicted and actual performance. Deviations of the fabricated structures from an ideal design (interfacial roughness and diffusion, microvoids, impurities, thickness errors) degrade the reflectance properties. In addition, deviations of the physical properties of very thin films from those of the bulk materials can limit the validity of reflectance calculations. We describe these difficulties and how a particular fabrication-characterization procedure can help solve them. Characterization techniques used include a variety of x-ray diffraction techniques, Rutherford Backscattering Spectroscopy and Transmission Electron Microscopy. Examples of results obtained for samples prepared by triode magnetically confined dc sputtering will be given, as will a discussion of the implication of these results for other multilayer materials.

UR - http://www.scopus.com/inward/record.url?scp=0023572570&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0023572570&partnerID=8YFLogxK

U2 - 10.1016/0749-6036(88)90266-2

DO - 10.1016/0749-6036(88)90266-2

M3 - Article

AN - SCOPUS:0023572570

VL - 4

SP - 51

EP - 53

JO - Superlattices and Microstructures

JF - Superlattices and Microstructures

SN - 0749-6036

IS - 1

ER -