Reactive sputtering of molybdenum sulfide thin films

Jacob A. Obeng, Glenn L. Schrader

Research output: Contribution to journalArticle

8 Scopus citations

Abstract

MoSx films have been deposited by r.f. sputtering of an Mo target in an H2S/Ar atmosphere. Relationships between process conditions and chemical composition, crystalline orientation, and morphology suggest that control of MoSx film properties are summarized. Preparation of dense, thick MoSx films with x>1.8 and with preferred "basal" orientation is shown.

Original languageEnglish (US)
Pages (from-to)422-426
Number of pages5
JournalSurface and Coatings Technology
Volume68-69
Issue numberC
DOIs
StatePublished - Dec 1994

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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