Reducing alignment and chromatic sensitivity of holographic optical interconnects with substrate-mode holograms

Raymond K Kostuk, Yang Tung Huang, Dale Hetherington, Masayuki Kato

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

The alignment and chromatic sensitivity of holographic optical elements for use in optical interconnect systems are quantified. The effects of these image degrading parameters are related to the frequency and power requirements for CMOS compatible detectors in an optical interconnect system. Techniques for reducing the magnitude of these problems with substrate-mode holograms are described, and experimental results demonstrating these designs are presented.

Original languageEnglish (US)
Pages (from-to)4939-4944
Number of pages6
JournalApplied Optics
Volume28
Issue number22
DOIs
StatePublished - Nov 15 1989

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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